Self-assembled 245-nm silica nanospheres.
These structures are later ion-implanted with Ge. Nanoclusters of the guest material, approximately 3-nm in size, are formed within the silica nanospheres following annealing at 1000oC.
The final result is 'nano within nano'
|
|
The structures have been ion-implanted with Si and Er ions as well.
PI/Collaborators
Haim Grebel, Ph.D.
Director, Electronic Imaging Center
haim.grebel@njit.edu